Silicon Nitride Manufacturers Analyze Product Knowledge

Feb 05, 2025 Leave a message

Silicon nitride is a ceramic material that is important for creating durable structures. It is a very solid substance that has a natural lubrication and is made up of atoms arranged like crystals. It does not rust at high temperatures and can also withstand extreme hot and cold temperatures. It can be heated in air to a temperature of more than 1000°C and will not break even if it is cooled quickly and reheated. These characteristics make it useful for making engine parts such as bearings, turbine blades, mechanical seal rings, and molds. It is also used to make the heating surface of some engine parts because it conducts heat poorly. This improves the performance of diesel engines, saves fuel and improves thermal efficiency.

Silicon nitride ceramic materials are also very stable at high temperatures, do not break down under the influence of oxygen, and can be made very large and dense. Silicon nitride is a covalent compound with a strong bond and can form an oxide protective film in air, so it is also very stable chemically and does not break down at temperatures below 1200°C. The protective film formed at 1200~1600°C can prevent further oxidation. It does not react with many molten metals and alloys, such as aluminum, lead, tin, silver, brass, nickel, etc., but can be corroded by molten liquids, such as magnesium, nickel-chromium alloy, stainless steel, etc


components and sealing elements in the chemical industry, as well as in knives and cutting tools in the process industry.

Because silicon nitride can form a strong bond with silicon carbide, alumina, thorium dioxide, boron nitride, etc., it can be used as a binder material and modified in various proportions.


After the PECVD silicon nitride film is applied, it can be used as an anti-reflective film to reduce light reflection. In the process of silicon nitride film deposition, hydrogen atoms enter the silicon nitride film and onto the silicon wafer, which plays a role in the passivation of defects. The ratio of the atomic numbers of silicon nitride and silicon is not strictly 4:3, but varies within a certain range depending on different process conditions, and the different ratios correspond to the different physical properties of the film.